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Focus on R & D and manufacturer of plasma cleaning machine for 20 years
The role of plasma cleaning technology on the surface of the cathode panel: Vacuum optoelectronic devices represented by low-light image intensifiers have a wide range of applications in national d...
Release time:2021-06-19
Industrial plasma plasma cleaning machine improves material performance in the printing industry: The application of industrial plasma plasma cleaning machine in the printin...
Release time:2021-06-17
Hydrophilicity of grafted modified polylactic acid scaffold with low temperature plasma grafting instrument: Polylactic acid is currently one of the most widely used synthet...
Release time:2021-06-15
The timeliness of the circuit board processing process of the vacuum plasma cleaning machine: The process, time and treatment plan of circuit board processing with vacuum pl...
Release time:2021-06-12
The vacuum processing technology of vacuum plasma processor is a technology that has been fully proven and widely used in etching and surface modification in the electronics industry. It is increa...
Release time:2021-06-10
Semiconductor packaging and plasma cleaning activation treatment can improve the yield and reliability of semiconductor materials. Plasma treatment solutions, wafer-level p...
Release time:2021-06-08
The automatic vacuum plasma cleaning machine supports manual and automatic operation. The volume of the plasma cleaning machine and the short cycle achieved by the propriet...
Release time:2021-06-06
The advantages of vacuum plasma cleaning system: The plasma cleaner system made of high-quality alumina and ceramics has excellent durability. The low-cost reactive ion etch...
Release time:2021-05-21
CRF-VPO-4L-S
CRF -APO-IP-XXHD-DXX
CRF-APO-500W-C
CRF-APO-IP-XXHD-RXX
CRF-APO-RP1020-D
CRF-VPO-8L-M
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