Support material testing and equipment testing
Focus on R & D and manufacturer of plasma cleaning machine for 20 years
CRF-APO-R&D-RXX
13632675935
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Name
Jet type AP plasma processing system
Plasma power supply model
CRF-APO-R&D-RXX
Rotary spray type plasma spray gun model
Rotary spray type:RXX(Option:20mm-80mm)
Power supply
220V/AC,50/60Hz
Power
1000W/25KHz(Option)
Power factor
0.8
Processing height
5-15mm
Handling wide format
Rotary jet type:20-80mm(Option)
Internal control mode
Digital control
External control mode
Start and stopI/O
Working gas
Compressed Air (0.4mpa)/N2(0.2mpa)
Power supply weight
8kg
What are the effects of the copper lead frame and the material box due to plasma treatment
The mechanism of plasma cleaning mainly relies on the "activation" of active particles in the plasma to achieve the purpose of removing stains on the surface of the object. In terms of reaction mechanism, plasma cleaning usually includes the following processes: inorganic gas is excited into a plasma state; gas phase substances are adsorbed on the solid surface; adsorbed groups react with solid surface molecules to form product molecules; product molecules resolve to form a gas phase; reaction The residue is detached from the surface.In addition, whether the lid of the material box is to be covered or not, and when to cover it, all have an impact on the plasma cleaning effect. The related factors of plasma cleaner power supply power include energy power size and unit power density. The greater the power of the power supply, the higher the plasma energy, and the stronger the surface bombardment of the copper bracket; under the same power, the less copper bracket is processed, the greater the unit power density will be, and the better the cleaning effect will be. Good, but it may cause excessive energy, discoloration or burning of the board. The plasma electric field distribution related factors of the plasma cleaning machine include electrode structure, gas flow direction and the placement position of the copper bracket. Different processing materials, process requirements and production capacity requirements have different electrode structure designs; therefore, the gas flow direction will form a gas field, which will affect the plasma movement, reaction, and uniformity; the placement of the copper bracket, It will affect the electric field and gas field characteristics, resulting in unbalanced energy distribution, and local plasma density is too large and burned.
Top 500 enterprises choose brands for a long time
20 years of independent R & D experience in top 500 enterprises, a number of technology patent certification.
Adopt imported components through EU CE certification so that you can use them without worry.
Professional R & D team
Has a number of assembly engineers who have been engaged in the industry for more than ten years.
Advanced equipment
Certification treats every equipment test
Strict quality control
The equipment runs and debugs continuously for 24 hours before coming out.
Perfect service system
A high-tech enterprise integrating R & D, manufacturing, production and sales of plasma equipment.
The service industry has a wide range of fields.
Focus on plasma research and development for 20 years, serving a variety of industries
Special customizable equipment
Make the equipment completely according to the customer's requirements.
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13632675935